发明授权
- 专利标题: Surface treatment apparatus
- 专利标题(中): 表面处理装置
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申请号: US908913申请日: 1992-07-02
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公开(公告)号: US5246526A公开(公告)日: 1993-09-21
- 发明人: Sumio Yamaguchi , Akio Inada , Kenichi Kawasumi
- 申请人: Sumio Yamaguchi , Akio Inada , Kenichi Kawasumi
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-165461 19890629
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
In a surface treatment apparatus, an organic substance is removed through ashing by ultraviolet rays and ozone at atmospheric pressure. A transparent partition plate is provided in closely spaced, opposed relation to a material to be treated, and at least one gas outlet is open to that surface of the partition plate opposed to the material to be treated. With this arrangement, the gas can be directly collected via the gas outlet during the treatment, and the end point of the organic substance removal treatment can be detected by analyzing the collected gas.
公开/授权文献
- US4925541A Electodeionization apparatus and method 公开/授权日:1990-05-15
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