发明授权
- 专利标题： High-vacuum coating apparatus
- 专利标题（中）： 高真空镀膜装置
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申请号： US914752申请日： 1992-07-15
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公开(公告)号： US5254169A公开(公告)日： 1993-10-19
- 发明人: Karl-Heinrich Wenk
- 申请人： Karl-Heinrich Wenk
- 申请人地址： DEX Hanau
- 专利权人： Leybold Aktiengesellschaft
- 当前专利权人： Leybold Aktiengesellschaft
- 当前专利权人地址： DEX Hanau
- 优先权： DEX4207525 19920310
- 主分类号： C23C14/56
- IPC分类号： C23C14/56 ; C23C14/24 ; C23C14/26
摘要：
A vacuum tank (1) in which a film is coated under high vacuum is divided by a partition wall (26) into a coating chamber (28) and a winding chamber (27) containing a supply roll (21) and a take-up roll (22). The coating chamber (28) contains an evaporator bank (24). Into the latter a coating cylinder (27) reaches. Diffusion pumps (14, 15) are connected exclusively to the coating chamber (28), so that the high vacuum necessary for the coating need be produced only in this coating chamber (28) and not in the entire vacuum tank (1). An inflatable gasket (32), variable in cross section, seals the partition wall (26) from the vacuum tank wall (1).
公开/授权文献
- US5886385A Semiconductor device and manufacturing method thereof 公开/授权日：1999-03-23