发明授权
- 专利标题： Method of manufacturing photomask
- 专利标题（中）： 制造光掩模的方法
-
申请号： US777189申请日： 1991-10-16
-
公开(公告)号： US5254418A公开(公告)日： 1993-10-19
- 发明人: Kazuya Kamon , Junji Miyazaki , Hitoshi Nagata
- 申请人： Kazuya Kamon , Junji Miyazaki , Hitoshi Nagata
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-285466 19901022
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/28 ; G03F1/30 ; G03F9/00
摘要：
A method of manufacturing a photomask, according to the present invention, comprises the step of entirely forming an intermediate shifter on a transparent substrate, light shielding layers and a phase shifter such that the thickness of the intermediate shifter successively varies. In edge portion of the phase shifter, thus, the phase of light is continuosly shifted from 0 to 180 degree. As in result, light intensity at the edge portion does not decrease to zero but has a relatively large value, preventing a bridge to be formed.
公开/授权文献
- US5245314A Location monitoring system 公开/授权日：1993-09-14
信息查询
