Invention Grant
- Patent Title: Method of manufacturing a planarized magnetoresistive sensor
- Patent Title (中): 平面化磁阻传感器的制造方法
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Application No.: US761001Application Date: 1991-09-17
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Publication No.: US5256249APublication Date: 1993-10-26
- Inventor: Wei C. Hsie , Michael M. Collver
- Applicant: Wei C. Hsie , Michael M. Collver
- Applicant Address: CA Scotts Valley
- Assignee: Seagate Technology, Inc.
- Current Assignee: Seagate Technology, Inc.
- Current Assignee Address: CA Scotts Valley
- Main IPC: G11B5/39
- IPC: G11B5/39 ; B44C1/22 ; C23F1/00
Abstract:
A magnetoresistive sensor includes a track width oxide layer which overlies a magnetoresistive element. Etch stop layers lie on opposite sides of the magnetoresistive element adjacent a magnetoresistive element. Contact/boundary control layers overlie the etch stop layer and lie adjacent the track width oxide layer. A separate loft oxide layer overlies the contact/boundary control layers and the track width oxide layer. The magnetoresistive sensor is formed by depositing a track width oxide to a thickness of the contact/boundary control layers.
Public/Granted literature
- US5770167A Waste gas treating apparatus Public/Granted day:1998-06-23
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