发明授权
- 专利标题: Negative type lithographic printing plate
- 专利标题(中): 负型平版印刷版
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申请号: US774190申请日: 1991-10-10
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公开(公告)号: US5272041A公开(公告)日: 1993-12-21
- 发明人: Ludo L. Van Rompuy
- 申请人: Ludo L. Van Rompuy
- 申请人地址: BEX Mortsel
- 专利权人: Agfa-Gevaert, N.V.
- 当前专利权人: Agfa-Gevaert, N.V.
- 当前专利权人地址: BEX Mortsel
- 优先权: EPXEP90202789.5 19901019
- 主分类号: B41C1/00
- IPC分类号: B41C1/00 ; B41N1/08 ; G03C8/06 ; G03F7/00 ; G03F7/07 ; G03C8/32
摘要:
The present invention provides a method for obtaining a negative type lithographic printing plate comprising the steps of (i) image-wise exposing a diffusion transfer reversal imaging element comprising a direct positive silver halide emulsion that mainly forms an internal latent image and a layer containing physical development nuclei, (ii) fogging said image-wise exposed imaging element, (iii) developing said imaging element using a surface developer, (iv) transfering the undeveloped silver salts in the non-exposed areas to said layer containing physical development nuclei and (v) image-wise depositing said silver salts on said physical development nuclei in the presence of physical development restraining compound(s).
公开/授权文献
- US6069036A Method of fabricating semiconductor device 公开/授权日:2000-05-30
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