Invention Grant
- Patent Title: Alignment method for transfer and alignment device
- Patent Title (中): 转移和对准装置的对准方法
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Application No.: US752010Application Date: 1991-08-29
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Publication No.: US5272980APublication Date: 1993-12-28
- Inventor: Satoshi Takeuchi , Kenji Asaka
- Applicant: Satoshi Takeuchi , Kenji Asaka
- Applicant Address: JPX
- Assignee: Dai Nippon Printing Co. Ltd.
- Current Assignee: Dai Nippon Printing Co. Ltd.
- Current Assignee Address: JPX
- Priority: JPX2-231563 19900831; JPX2-259304 19900928
- Main IPC: G03F9/00
- IPC: G03F9/00 ; H01L21/68 ; H05K1/02 ; H05K3/00 ; B41F9/00
Abstract:
While a pattern side register mark provided on a pattern transferring plate provided with a transfer pattern and a work side register mark provided on a work are optically observed by means of an observation optical system, at least one of the pattern transferring plate and a work surface plate carrying thereon the work is moved in a non-contact state in accordance with information provided by the observation optical system to effect registration between the transfer pattern and the work, so that the pattern transferring plate is pressed to the work thereby to transfer the transfer pattern onto the work.
Public/Granted literature
- US5917842A Error-free frame handling for jammed data frames Public/Granted day:1999-06-29
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