发明授权
- 专利标题: Silicon nitride sintered body and process for producing the same
- 专利标题(中): 氮化硅烧结体及其制造方法
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申请号: US957506申请日: 1992-10-05
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公开(公告)号: US5275772A公开(公告)日: 1994-01-04
- 发明人: Takehisa Yamamoto , Takao Nishioka , Kenji Matsunuma , Akira Yamakawa , Masaya Miyake
- 申请人: Takehisa Yamamoto , Takao Nishioka , Kenji Matsunuma , Akira Yamakawa , Masaya Miyake
- 申请人地址: JPX
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX3-117315 19910522; JPX3-221603 19910902
- 主分类号: C04B35/593
- IPC分类号: C04B35/593 ; C04B35/597 ; C04B35/58
摘要:
The present invention relates to a silicon nitride sintered body [wherein the composition of Si.sub.3 N.sub.4 -first aid (Y.sub.2 O.sub.3 +MgO)-second aid (at least one of Al.sub.2 O.sub.3 and AlN)] falls within a range defined by lines joining points A, B, C and D in FIG. 1, the crystal phase of the sintered body contains both .alpha.-Si.sub.3 N.sub.4 and .beta.'-sialon, and the relative density is 98% or more. This sintered body is produced by subjecting a green compact of the above-described source to primary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 96% or more, and the precipitation ratio of the .alpha.-Si.sub.3 N.sub.4 crystal phases to the .beta.'-sialon crystal phase in the sintered body is in the range of from 40:60 to 80:20; and then subjecting the primary sintered body to secondary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 98% or more. The sintered body has superior strength properties, especially at ordinary temperatures, and can be produced with a high productivity in a high yield at a low cost.
公开/授权文献
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