发明授权
- 专利标题: Silica scale inhibition
- 专利标题(中): 二氧化硅垢抑制
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申请号: US5411申请日: 1993-01-19
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公开(公告)号: US5277823A公开(公告)日: 1994-01-11
- 发明人: William M. Hann , Judy H. Bardsley , Susan T. Robertson , Jan E. Shulman
- 申请人: William M. Hann , Judy H. Bardsley , Susan T. Robertson , Jan E. Shulman
- 申请人地址: PA Philadelphia
- 专利权人: Rohm and Haas Company
- 当前专利权人: Rohm and Haas Company
- 当前专利权人地址: PA Philadelphia
- 主分类号: C02F5/08
- IPC分类号: C02F5/08 ; C02F5/10 ; C02F5/12
摘要:
A method for inhibiting silica scale formation in aqueous systems using selected low molecular weight (meth)acrylic or maleic acid based copolymers or terpolymers, magnesium ion alone, or the selected copolymers and terpolymers with aluminum ion or magnesium ion, or polyacrylic or polymaleic acid with aluminum ion or magnesium ion.
公开/授权文献
- USD348708S Jogging exerciser 公开/授权日:1994-07-12