发明授权
US5296096A Etchant for production of electrode plate structure for liquid crystal
display device
失效
用于制造液晶显示装置的电极板结构的蚀刻剂
- 专利标题： Etchant for production of electrode plate structure for liquid crystal display device
- 专利标题（中）： 用于制造液晶显示装置的电极板结构的蚀刻剂
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申请号： US743020申请日： 1991-08-09
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公开(公告)号： US5296096A公开(公告)日： 1994-03-22
- 发明人: Takashi Enomoto , Masayuki Shimamune , Keishi Danjo
- 申请人： Takashi Enomoto , Masayuki Shimamune , Keishi Danjo
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-211626 19900813; JPX3-218071 19910805
- 主分类号： C04B41/53
- IPC分类号： C04B41/53 ; C04B41/91 ; C23F1/30 ; G02F1/1343 ; H01B5/14 ; H01B13/00 ; H01L31/18 ; H05K3/06 ; H01L21/00
摘要：
An ITO (indium tin oxide) film on a substrate is effectively etched by an etchant which is an aqueous solution containing hydrogen iodide and ferric chloride to form an electrode plate structure for liquid crystal display device. The etchant does not corrode an Mo or Mo alloy film and accordingly can selectively etch the ITO film already carrying thereon a pattern of Mo or Mo alloy forming an auxiliary electrode for compensating for the resistivity of the ITO film. The etchant is also effective for etching of the ITO film formed on an organic layer.
公开/授权文献
- US5690168A Quench exchanger 公开/授权日：1997-11-25