发明授权
- 专利标题: Sulfate-free electroless copper plating baths
- 专利标题(中): 无硫酸化无电镀铜浴
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申请号: US979097申请日: 1992-11-20
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公开(公告)号: US5306336A公开(公告)日: 1994-04-26
- 发明人: Nicholas M. Martyak , Bruce F. Monzyk , Henry H. Chien
- 申请人: Nicholas M. Martyak , Bruce F. Monzyk , Henry H. Chien
- 申请人地址: MO St. Louis
- 专利权人: Monsanto Company
- 当前专利权人: Monsanto Company
- 当前专利权人地址: MO St. Louis
- 主分类号: C23C18/40
- IPC分类号: C23C18/40 ; C23C18/38
摘要:
Sulfate-free electroless copper baths comprising cupric ions, formaldehyde, formate ions, hydroxyl ions, a copper counterion, e g. preferably a monovalent anion such as acetate, nitrate or formate, and copper chelant such as an alkali metal salt of aminotris(methylenephosphonic acid), biscarboxymethylaspartic acid, ethylenediaminetetra(methylenephosphonic acid), diethylenetriaminepenta(methylenephosphonic acid), gluconic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, mucic acid, D-saccharac acid, tartaric acid and N,N,N',N'-tetrakis(2-hydroxypropyl)ethylenediamine are amenable to the recovery of copper, e.g. from purge streams, using the methods and apparatus including solvent extraction, e.g. employing hydroxamic acid extractants, anion filtration, ion-exchange and chelant precipitation.
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