发明授权
- 专利标题: Closed container to be used in a clean room
- 专利标题(中): 封闭的容器用于洁净室
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申请号: US042644申请日: 1993-04-05
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公开(公告)号: US5320218A公开(公告)日: 1994-06-14
- 发明人: Teppei Yamashita , Masanao Murata , Tsuyoshi Tanaka , Teruya Morita , Hitoshi Kawano , Atsushi Okuno , Masanori Tsuda , Mitsuhiro Hayashi
- 申请人: Teppei Yamashita , Masanao Murata , Tsuyoshi Tanaka , Teruya Morita , Hitoshi Kawano , Atsushi Okuno , Masanori Tsuda , Mitsuhiro Hayashi
- 申请人地址: JPX Tokyo
- 专利权人: Shinko Electric Co., Ltd.
- 当前专利权人: Shinko Electric Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-84411 19920407
- 主分类号: B65D88/12
- IPC分类号: B65D88/12 ; B65D81/20 ; B65D85/38 ; B65D85/86 ; B65G49/00 ; B65G49/07 ; F24F7/007 ; H01L21/02 ; H01L21/673 ; B65B1/04 ; H01L21/00
摘要:
A wafer storing, closed container for use in a clean room of a semiconductor manufacturing system is provided with an attached inert gas tank so as to eliminate the need to convey the container to an inert gas purge station to supplement the inert gas supply in the container due to leakage. A gas passageway is formed in a body of the container in such a manner that one end thereof is open inside the container. The other end is open outside the container. The portable inert gas tank is detachably connected to the other end of the gas passageway so as to automatically supplement the container with the inert gas.
公开/授权文献
- US6123951A Colored cosmetic composition 公开/授权日:2000-09-26
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