发明授权
- 专利标题: Substrate holding apparatus of a simple structure for holding a rotating substrate, and a substrate processing apparatus including the substrate holding apparatus
- 专利标题(中): 用于保持旋转基板的简单结构的基板保持装置,以及包括基板保持装置的基板处理装置
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申请号: US952281申请日: 1992-09-28
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公开(公告)号: US5322079A公开(公告)日: 1994-06-21
- 发明人: Yoshiteru Fukutomi , Masami Ohtani , Yasushi Nakamura
- 申请人: Yoshiteru Fukutomi , Masami Ohtani , Yasushi Nakamura
- 申请人地址: JPX
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX3-276915 19910927
- 主分类号: H01L21/304
- IPC分类号: H01L21/304 ; B08B11/02 ; G03F7/16 ; H01L21/306 ; H01L21/683 ; H01L21/687 ; B08B3/02
摘要:
A substrate holding apparatus includes a rotary table rotatable about a vertical center axis for supporting a substrate in a horizontal plane, and substrate travel regulating pins fixed to the rotary table and arranged at positions in contact with the outer edge of the substrate so that the center of gravity of the substrate supported on the rotary table is spaced from the center axis for regulating the travel of the substrate in a horizontal direction. Centrifugal force generated with respect to the substrate when the rotary table rotates about the center axis, urges the periphery of the substrate towards the travel regulating pins so that the resulting frictional force prevents rotary slippage between the substrate and the rotary table as rotation of the latter relates to the latter. The structure of this apparatus is simple because the substrate holding portion does not include a movable portion. It is easy to mount a substrate onto this apparatus because it is not necessary to align the orientation flat and the like at a predetermined position.
公开/授权文献
- US6052395A Pulse laser 公开/授权日:2000-04-18
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