发明授权
US5322765A Dry developable photoresist compositions and method for use thereof
失效
干可显影光致抗蚀剂组合物及其使用方法
- 专利标题： Dry developable photoresist compositions and method for use thereof
- 专利标题（中）： 干可显影光致抗蚀剂组合物及其使用方法
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申请号： US796527申请日： 1991-11-22
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公开(公告)号： US5322765A公开(公告)日： 1994-06-21
- 发明人: Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
- 申请人： Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/029 ; G03F7/038 ; G03F7/039 ; G03F7/26 ; G03F7/36 ; G03F7/38 ; H01L21/027 ; H01L21/30 ; G03C1/72 ; G03F7/00
摘要：
Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
公开/授权文献
- US4596847A Polyacetal resin composition 公开/授权日：1986-06-24