发明授权
US5324364A Pin junction photovoltaic device having an i-type a-SiGe semiconductor
layer with a maximal point for the Ge content
失效
具有具有Ge含量最大点的i型a-SiGe半导体层的pin结光电器件
- 专利标题: Pin junction photovoltaic device having an i-type a-SiGe semiconductor layer with a maximal point for the Ge content
- 专利标题(中): 具有具有Ge含量最大点的i型a-SiGe半导体层的pin结光电器件
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申请号: US45176申请日: 1993-04-13
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公开(公告)号: US5324364A公开(公告)日: 1994-06-28
- 发明人: Koichi Matsuda , Masafumi Sano , Tsutomu Murakami
- 申请人: Koichi Matsuda , Masafumi Sano , Tsutomu Murakami
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-119843 19920415; JPX5-085105 19930322
- 主分类号: H01L31/04
- IPC分类号: H01L31/04 ; H01L31/0376 ; H01L31/075
摘要:
A pin junction photovoltaic device comprising a substrate and a pin junction semiconductor active layer region disposed on said substrate, said pin junction semiconductor active layer region comprising a p-type semiconductor layer composed of a p-type non-single crystalline semiconductor material, an i-type semiconductor layer composed of an i-type non-single crystalline semiconductor material, and an n-type semiconductor layer composed of an n-type non-single crystalline semiconductor material, characterized in that (a) a buffer layer comprising a non-single crystalline silicon semiconductor material substantially free of germanium atoms is interposed between said p-type semiconductor layer and said i-type semiconductor layer, (b) a buffer layer comprising a non-single crystalline silicon semiconductor material substantially free of germanium atoms is interposed between said i-type semiconductor layer and said n-type semiconductor layer, and said i-type semiconductor layer is formed of an amorphous silicon germanium semiconductor material containing the germanium atoms in an amount of 20 to 70 atomic % in the entire region in which the concentration distribution of the germanium atoms in the thickness direction is varied while providing a maximum concentration point.
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