发明授权
- 专利标题: Tunable scorotron for depositing uniform charge potential
- 专利标题(中): 用于沉积均匀电荷势的可调式电磁铁
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申请号: US992512申请日: 1992-12-17
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公开(公告)号: US5324942A公开(公告)日: 1994-06-28
- 发明人: Satchidanand Mishra , Edward A. Domm , Denis C. Thomas
- 申请人: Satchidanand Mishra , Edward A. Domm , Denis C. Thomas
- 申请人地址: CT Stamford
- 专利权人: Xerox Corporation
- 当前专利权人: Xerox Corporation
- 当前专利权人地址: CT Stamford
- 主分类号: G03G15/02
- IPC分类号: G03G15/02 ; H01T19/00 ; H01T19/04
摘要:
The present invention is an apparatus for tuning or altering the charge potential limiting effect that a scorotron grid has upon an adjacent charge receiving surface. The scorotron charging apparatus utilizes corona producing means, spaced above the charge retentive surface, for emitting corona ions in response to a high voltage potential applied thereto, and a flexible grid, suspended between said corona producing means and the charge retentive surface in a nonplanar fashion, such that the spacing between said grid and the charge retentive surface is variable along at least one region of said grid.
公开/授权文献
- US5893803A Putting stroke training device 公开/授权日:1999-04-13
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