发明授权
US5330877A Photosensitive compositions containing stilbazolium groups 失效
含有芪唑基的光敏组合物

Photosensitive compositions containing stilbazolium groups
摘要:
Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimercezing on exposure to active radiation to yield water-soluble photoresist materials.
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