发明授权
- 专利标题： Ceramic rotatable magnetron sputtering cathode target and process for its production
- 专利标题（中）： 陶瓷可旋转磁控溅射阴极靶及其生产工艺
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申请号： US936281申请日： 1992-08-28
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公开(公告)号： US5354446A公开(公告)日： 1994-10-11
- 发明人: Otojiro Kida , Akira Mitsui , Atsushi Hayashi
- 申请人： Otojiro Kida , Akira Mitsui , Atsushi Hayashi
- 申请人地址： JPX Tokyo
- 专利权人： Asahi Glass Company Ltd.
- 当前专利权人： Asahi Glass Company Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX63-48765 19880303; JPX63-76202 19880331; JPX63-144827 19880614; JPX63-264163 19881021; JPX1-197993 19890801; JPX1-224484 19890901; JPX2-161413 19900621; JPX3-242557 19910828; JPX3-242558 19910828
- 主分类号： C03C17/245
- IPC分类号： C03C17/245 ; C03C17/34 ; C23C14/08 ; C23C14/34 ; G02B1/10 ; G02F1/1333 ; G02F1/1335 ; H01J37/34
摘要：
A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.
公开/授权文献
- US4737842A Color emphasis circuit 公开/授权日：1988-04-12