发明授权
- 专利标题： Projection exposing apparatus and projection exposing method
- 专利标题（中）： 投影曝光装置和投影曝光方法
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申请号： US131969申请日： 1993-10-08
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公开(公告)号： US5367358A公开(公告)日： 1994-11-22
- 发明人: Kazuya Kamon
- 申请人： Kazuya Kamon
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-271972 19921009; JPX5-182659 19930723
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03F7/20 ; H01L21/027 ; H01L21/30 ; G03B27/72 ; G03B27/42
摘要：
A projection exposing apparatus has a second photo-mask disposed on a blind for determining a region to be exposed to deformed light beams, the circuit pattern of the second photo-mask being the same as or arranged to correspond to the circuit pattern of a first photo-mask to be projected onto a substrate The deformed irradiation light beams are applied to the second photo-mask circuit pattern to image diffracted light beams on the substrate and project the circuit pattern.
公开/授权文献
- US06099374A Lubrication and oil drain system for 4 cycle outboard motor 公开/授权日：2000-08-08
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