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US5375157A X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure 失效
X射线掩模结构及其制造方法，利用X射线掩模结构的曝光方法以及使用X射线掩模结构

  • 专利标题： X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure
  • 专利标题（中）： X射线掩模结构及其制造方法，利用X射线掩模结构的曝光方法以及使用X射线掩模结构
  • 申请号： US91383
    申请日： 1993-07-15
  • 公开(公告)号： US5375157A
    公开(公告)日： 1994-12-20
  • 发明人: Hiroshi Maehara
  • 申请人： Hiroshi Maehara
  • 申请人地址： JPX Tokyo
  • 专利权人： Canon Kabushiki Kaisha
  • 当前专利权人： Canon Kabushiki Kaisha
  • 当前专利权人地址： JPX Tokyo
  • 优先权： JPX4-192199 19920720; JPX5-161953 19930630
  • 主分类号： G03F1/22
  • IPC分类号： G03F1/22 ;  G03F7/20 ;  H01L21/027 ;  G03F1/00
X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure
摘要：
The present invention provides an X-ray mask structure a production method thereof, and an exposure method therefor, whereby patterns can be formed faithfully to designed device line widths regardless of the thickness distribution of an X-ray transmissive membrane. The present invention also provides a device exhibiting stable and high performance fabricated by means the X-ray mask structure. In accordance with the present invention, the X-ray mask structure comprises X-ray absorbers, an X-ray transmissive membrane for supporting the X-ray absorbers, and a supporting frame for supporting the X-ray transmissive membrane, wherein the line widths of the X-ray absorbers are compensated corresponding to the thickness distribution of the X-ray transmissive membrane so that the deviation of the line widths of transferred patterns from the desired line widths of the patterns may be cancelled. A method for producing the X-ray mask structure, an exposure method using the X-ray mask structure, and a device fabricated by use of the X-ray mask structure are also disclosed.
摘要（中）：

本发明提供了一种X射线掩模结构及其制造方法及其曝光方法，其中可以忠实地形成图案以设计设备线宽，而与X射线透射膜的厚度分布无关。 本发明还提供了一种显示出通过X射线掩模结构制造的稳定和高性能的器件。 根据本发明，X射线掩模结构包括X射线吸收体，用于支撑X射线吸收体的X射线透过膜，以及用于支撑X射线透过膜的支撑框架，其中线宽 对应于X射线透射膜的厚度分布来补偿X射线吸收体，从而可以消除转印图案的线宽与图案的所需线宽的偏差。 还公开了一种用于制造X射线掩模结构的方法，使用该X射线掩模结构的曝光方法和使用该X射线掩模结构制造的器件。

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