发明授权
US5384231A Fabricating lens array structures for imaging devices 失效
制造用于成像装置的透镜阵列结构

Fabricating lens array structures for imaging devices
摘要:
A method of forming a planarized layer on a CCD device to permit a lens array to be formed which includes etching a B.sub.2 O.sub.3 layer provided on a conformally coated SiO.sub.2 layer until a sufficient amount of the deposited B.sub.2 O.sub.3 layer is removed to provide a planarized surface.
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