发明授权
- 专利标题: Raw material for high oxygen chromium target
- 专利标题(中): 高氧铬靶材原料
-
申请号: US73711申请日: 1993-06-09
-
公开(公告)号: US5397373A公开(公告)日: 1995-03-14
- 发明人: Hidenori Tomioka , Kenichi Kobayashi , Manabu Takahashi , Tatsuhiko Fujinuma
- 申请人: Hidenori Tomioka , Kenichi Kobayashi , Manabu Takahashi , Tatsuhiko Fujinuma
- 申请人地址: JPX Tokyo
- 专利权人: Japan Metals & Chemicals Co., Ltd.
- 当前专利权人: Japan Metals & Chemicals Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 主分类号: C22C32/00
- IPC分类号: C22C32/00 ; C23C14/34 ; C22C29/12
摘要:
A raw material for high oxygen chromium targets comprising chromium crystalline particles dispersed in metallic chromium wherein at least a portion of the surface of all the crystals constituting the oxide crystalline particles is in contact with the matrix of said metallic chromium. And a method of producing a raw material for high oxygen chromium targets comprising chromium oxide crystalline particles dispersed in metallic chromium characterized by heat-treating metallic chromium containing a solid solution of oxygen or oxide particles as a starting material, and precipitating or crystal-growing the oxygen or oxide particles as chromium oxide crystalline particles having a particle size of 0.1 to 100, .mu.m, thereby obtaining a raw material for chromium targets.
公开/授权文献
- USD406205S Storage and display stand 公开/授权日:1999-03-02
信息查询