发明授权
- 专利标题： Vacuum processing system
- 专利标题（中）： 真空加工系统
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申请号： US62853申请日： 1993-05-18
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公开(公告)号： US5398481A公开(公告)日： 1995-03-21
- 发明人: Noriyuki Takeuchi , Masaaki Kajiyama , Fumio Kondo , Masao Matsumura , Takeshi Yoshioka
- 申请人： Noriyuki Takeuchi , Masaaki Kajiyama , Fumio Kondo , Masao Matsumura , Takeshi Yoshioka
- 申请人地址： JPX Tokyo
- 专利权人： Ebara Corporation
- 当前专利权人： Ebara Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-151389 19920519; JPX4-290817 19921005; JPX4-327220 19921112
- 主分类号： H01L21/677
- IPC分类号： H01L21/677 ; H01L21/00 ; B65B49/05
摘要：
Several vacuum process steps are applied to substrates such as a wafer using a vacuum container for storing and transporting the substrates under vacuum. The vacuum container comprises a container body having a main opening for inserting a substrate and taking out the substrate, a lid engageable with the container body for closing and sealing the main opening of the container body, and a gate provided on one of the container body and the lid for performing at least one of evacuating an interior of the vacuum container and raising the pressure of the interior of the vacuum container to ambient.
公开/授权文献
- USD394416S Flower pot 公开/授权日：1998-05-19
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