发明授权
- 专利标题: Method of and an apparatus for charged particle beam exposure
- 专利标题(中): 带电粒子束曝光的方法和装置
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申请号: US843172申请日: 1992-02-28
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公开(公告)号: US5404018A公开(公告)日: 1995-04-04
- 发明人: Hiroshi Yasuda , Yoshihisa Oae , Akio Yamada , Nobuyuki Yasutake , Hisayasu Nishino
- 申请人: Hiroshi Yasuda , Yoshihisa Oae , Akio Yamada , Nobuyuki Yasutake , Hisayasu Nishino
- 申请人地址: JPX Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX3-034424 19910228
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H01J37/317 ; H01L21/027 ; H01L21/30 ; H01J3/26
摘要:
A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main deflector. The main deflector deflects a charged particle beam in a direction X, while the subdeflector deflects the beam around the deflecting position of the main deflector to expose an object to the beam. An area to be exposed on the object is divided into thin subfields such that the width, in an X-axis direction of each subfield, is approximately 1/3 the length in a Y-axis direction of the same.
公开/授权文献
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