Invention Grant
- Patent Title: Method of etching aluminum foil
- Patent Title (中): 铝箔蚀刻方法
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Application No.: US187085Application Date: 1994-01-26
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Publication No.: US5405493APublication Date: 1995-04-11
- Inventor: David Goad
- Applicant: David Goad
- Applicant Address: JPX Ibaraki
- Assignee: KDK Corporation
- Current Assignee: KDK Corporation
- Current Assignee Address: JPX Ibaraki
- Main IPC: C23F1/44
- IPC: C23F1/44 ; C25F3/04 ; H01G9/04 ; B44C1/22 ; C23F1/00
Abstract:
A method of etching increases the surface area of a metal foil by creating uniformly distributed etch tunnels. The foil is pretreated by depositing a discontinuous surface layer of metal that is cathodic to the foil, followed by chemically etching the foil to remove a portion of the deposited metal. Finally, the foil is electrochemically etched to create the etch tunnels.
Public/Granted literature
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