发明授权
- 专利标题: Light-sensitive material treating apparatus
- 专利标题(中): 感光材料处理装置
-
申请号: US60059申请日: 1993-05-13
-
公开(公告)号: US5424799A公开(公告)日: 1995-06-13
- 发明人: Takashi Nakamura , Yasuhisa Ogawa
- 申请人: Takashi Nakamura , Yasuhisa Ogawa
- 申请人地址: JPX
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX4-163388 19920601
- 主分类号: G03C7/407
- IPC分类号: G03C7/407 ; G03C7/44 ; G03D3/00 ; G03D3/06 ; G03D13/00 ; G03D3/02
摘要:
A light-sensitive material treating apparatus which is small in size and produces a reduced quantity of waste fluid. A current conduction process is applied to a developing solution using an auxiliary tank communicated with a developing tank and to which a supplementary solution is supplied. The developing solution contains a developing agent which is oxidized to an oxidation state by reaction with silver halide and reduced to a reduction state by electronation. The auxiliary tank is separated into two chambers by a cation-exchange membrane, and a cathode and an anode are provided in respective ones of the chambers arranged opposite to each other with respect to the cation-exchange membrane. A current is applied between the two electrodes. The current conduction time is controlled on the basis of current conduction efficiency corresponding to the time of use.
公开/授权文献
- USD385915S Mechanical pencil 公开/授权日:1997-11-04
信息查询