发明授权
- 专利标题： Blanket tungsten deposition
- 专利标题（中）： 毯子钨沉积
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申请号： US336692申请日： 1994-11-07
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公开(公告)号： US5436200A公开(公告)日： 1995-07-25
- 发明人: Kaoru Tanaka
- 申请人： Kaoru Tanaka
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX5-338080 19931228
- 主分类号： H01L21/285
- IPC分类号： H01L21/285 ; C23C16/04 ; C23C16/44 ; C23C16/455 ; H01L21/205 ; H01L21/3205 ; H01L21/768 ; H01L23/52
摘要：
A blanket tungsten deposition apparatus comprises a reactor the inside of which is evacuatable, a gas inlet means for introducing a reaction gas into the reactor, mount means for mounting an object substrate to be treated, penetration-preventing means for preventing penetration of gas, disposed to cover a peripheral portion of a surface of the object substrate to be treated and having an inner diameter smaller than a diameter of the object substrate and an outer perimeter larger than that of the object substrate, and another gas inlet means for introducing a gas to a space on the periphery of the object substrate covered by the penetration-preventing means. Growth of W film on a peripheral SiO.sub.2 portion of substrate is prevented and hence production of particles caused by peeling-off of W film is prevented.
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