发明授权
- 专利标题: Silver halide photographic material
- 专利标题(中): 卤化银照相材料
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申请号: US329672申请日: 1994-10-25
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公开(公告)号: US5445930A公开(公告)日: 1995-08-29
- 发明人: Toru Harada , Itsuo Fujiwara
- 申请人: Toru Harada , Itsuo Fujiwara
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX4-215702 19920722
- 主分类号: G03C1/83
- IPC分类号: G03C1/83 ; G03C1/12
摘要:
A novel silver halide photographic material is provided, comprising a hydrophilic colloidal layer containing at least one dye represented by the following formula (I): ##STR1## wherein Y.sup.1 and Y.sup.2 each represents a chalcogen atom, --CH.dbd.CH--, --N(R.sup.10)--, or --C (R.sup.10)(R.sup.11)--, in which R.sup.10 and R.sup.11 each represents an alkyl group; Z.sup.1 and Z.sup.2 each represents a nonmetallic atom group necessary for forming a benzo condensed or naphtho condensed ring; R.sup.1 and R.sup.2 each represents an alkyl group; the plurality of L groups may be the same or different and each represents a methine group, with the proviso that at least one of the plurality of L groups represents a methine group substituted by --OR.sup.12, --N(R.sup.12)(R.sup.13), --SR.sup.12 or --CH(R.sup.14)(R.sup.15), in which R.sup.12 represents an alkyl or aryl group substituted by an acidic substituent, R.sup.13 represents a hydrogen atom or an alkyl or aryl group substituted by an acidic substituent, and R.sup.14 and R.sup.15 each represents a cyano group, a carboxylic acid group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, a sulfonyl group or a sulfamoyl group, with the proviso that at least one of R.sup.14 and R.sup.15 contains an acidic substituent; X represents an anion; p represents an integer 0 or 1; r represents an integer 0 or 1; m represents an integer 2 or 3; and n represents an integer 1 or 2, with the proviso that when the dye forms an intramolecular salt, n is 1; and wherein the dye contains at least three acidic substituents.
公开/授权文献
- US6156696A Hydrotalcite contact materials 公开/授权日:2000-12-05
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