发明授权
- 专利标题： Light controlled vapor deposition
- 专利标题（中）： 光控气相沉积
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申请号： US259199申请日： 1994-06-13
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公开(公告)号： US5449535A公开(公告)日： 1995-09-12
- 发明人: Alan D. Streater
- 申请人： Alan D. Streater
- 申请人地址： PA Bethlehem
- 专利权人： Competitive Technologies, Inc.
- 当前专利权人： Competitive Technologies, Inc.
- 当前专利权人地址： PA Bethlehem
- 主分类号： C23C14/18
- IPC分类号： C23C14/18 ; C23C14/28 ; B05D3/06
摘要：
A method is disclosed for depositing a substance on a substrate, including the following steps: providing the substrate in a deposition chamber, providing in the chamber a vapor of the substance, providing a buffer gas in the chamber, and directing a light beam at the substrate to control deposition of the substance by causing light induced drift.
公开/授权文献
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