发明授权
- 专利标题: Stabilizer system for thiol-ene and thiol-nene compositions
- 专利标题(中): 稳定剂体系,用于硫醇和烯烃组合物
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申请号: US81456申请日: 1993-06-22
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公开(公告)号: US5459173A公开(公告)日: 1995-10-17
- 发明人: David M. Glaser , Anthony F. Jacobine , Paul J. Grabek
- 申请人: David M. Glaser , Anthony F. Jacobine , Paul J. Grabek
- 申请人地址: CT Hartford
- 专利权人: Loctite Corporation
- 当前专利权人: Loctite Corporation
- 当前专利权人地址: CT Hartford
- 主分类号: C08K5/13
- IPC分类号: C08K5/13 ; C08G75/04 ; C08G75/14 ; C08K5/17 ; C08L81/04 ; C08K5/08
摘要:
Stable thiol-ene compositions are provided which comprise a polythiol, a polyene and a stabilizer system comprising an alkenyl substituted phenolic compound having a formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are independently selected from the group consisting of H, OR, a C.sub.1 -C.sub.8 alkyl, substituted alkyl, alkenyl or substituted alkenyl, a C.sub.6 -C.sub.20 aryl or substituted aryl, or a cyano group; R.sup.4 is H, R, OR, halogen, COR, COOR, or SR; R.sup.5 is OH, OR, OCOR, OCOOR, OCONHR, or OTMS; R is a C.sub.1 -C.sub.6 alkyl, a cycloalkyl, or a C.sub.6 -C.sub.20 caryl or substituted aryl; x and y are 1, 2, or 3; z is 0, 1, or 2; and x+y+z=2, 3, or 4; or a formula: ##STR2## where x, y, z, w, R.sup.1 R.sup.2 R.sup.3, R.sup.4 and R.sup.5 are defined as above, except that x+y+z=2-6, and R.sup.6 is CH.sub.2, C(CH.sub.3).sub.2, O, S, or SO.sub.2 ; and one or more compounds selected from the group consisting of a free radical scavenger, a hindered phenolic antioxidant and a hydroxylamine derivative.
公开/授权文献
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