发明授权
- 专利标题: Process for fabrication of thin film magnetic heads
- 专利标题(中): 制造薄膜磁头的工艺
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申请号: US231074申请日: 1994-04-22
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公开(公告)号: US5462637A公开(公告)日: 1995-10-31
- 发明人: Martin Thiele
- 申请人: Martin Thiele
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 优先权: EPX93111723 19930722
- 主分类号: G11B5/31
- IPC分类号: G11B5/31 ; B44C1/22 ; C23F1/02
摘要:
A process for the fabrication of thin film magnetic heads from a wafer is disclosed that provides improved stud adhesion, reduced risk of contamination, and elimination of corrosive elements along the magnetic pole tips. The process includes the steps of forming a first pole tip, forming simultaneously a second pole tip, lead straps and a layer at each stud location from plated pole tip material; applying a thin overcoat layer to the wafer; applying a first mask with an opening over each stud; removing the overcoat material in each opening with a noncorrosive etchant to expose the stud layer; removing the mask; applying a NiFe seed layer to the wafer; applying a second mask to the wafer having an opening over each stud slightly larger than that of the first mask; plating gold into each opening; and removing the second mask and the remaining seed layer.
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