发明授权
- 专利标题: Lithographic base and a method for making a lithographic printing plate therewith
- 专利标题(中): 平版印刷版及其制造方法
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申请号: US207709申请日: 1994-03-09
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公开(公告)号: US5462833A公开(公告)日: 1995-10-31
- 发明人: Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
- 申请人: Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
- 申请人地址: BEX Mortsel
- 专利权人: Agfa-Gevaert, N.V.
- 当前专利权人: Agfa-Gevaert, N.V.
- 当前专利权人地址: BEX Mortsel
- 优先权: EPX93200969 19930405
- 主分类号: B41N1/14
- IPC分类号: B41N1/14 ; B41N3/00 ; B41N3/03 ; G03F7/07 ; G03C1/93 ; G03F7/016
摘要:
The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer and a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica, the surface area of the silica being at least 300 m.sup.2 per gram.
公开/授权文献
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