发明授权
- 专利标题: Hydrophilic chemically adsorbed film
- 专利标题(中): 亲水化学吸附膜
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申请号: US250943申请日: 1994-05-31
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公开(公告)号: US5466523A公开(公告)日: 1995-11-14
- 发明人: Kazufumi Ogawa , Norihisa Mino , Mamoru Soga
- 申请人: Kazufumi Ogawa , Norihisa Mino , Mamoru Soga
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX3-098906 19910430; JPX3-098918 19910430; JPX3-143499 19910614
- 主分类号: B05D1/18
- IPC分类号: B05D1/18 ; B29D11/00 ; G02B1/10 ; B32B7/04
摘要:
A chemically adsorbed film containing hydrophilic groups is formed on a substrate such that it is chemically bonded by Si covalent bonds to the substrate. The adsorbed film has an improved hydrophilic property. In addition, the film provides an excellently durable and transparent fog-proof substrate. According to the method of the invention, a substrate containing hydrophilic groups is contacted with a non-aqueous solution containing a surface active material having straight chain molecules each having at one end a chlorosilyl group and at the other end at least one functional group selected from the group consisting of a bromo group, iodo group, cyano group, thiocyano group, chlorosilyl group etc. to cause a dehydrochlorination reaction between hydrophilic groups on the substrate surface and chlorosilyl groups of the surface active material, thereby forming a chemically adsorbed film on the substrate surface. The functional group at the other end of the surface active material is converted into at least one hydrophilic group selected from the group consisting of --OH, --COOH, --NH.sub.2, .dbd.NH, --N.sup.+ R.sub.3 X.sup.- (X representing a halogen atom, R represents a lower alkyl group), --NO.sub.2, --SH, and --S).sub.3 H groups.
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