Invention Grant
US5491534A Exposure apparatus and microdevice manufacturing method using the same
失效
曝光装置和微型装置制造方法使用该装置
- Patent Title: Exposure apparatus and microdevice manufacturing method using the same
- Patent Title (中): 曝光装置和微型装置制造方法使用该装置
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Application No.: US265140Application Date: 1994-06-24
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Publication No.: US5491534APublication Date: 1996-02-13
- Inventor: Takahisa Shiozawa
- Applicant: Takahisa Shiozawa
- Applicant Address: JPX Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JPX Tokyo
- Priority: JPX5-159054 19930629; JPX6-119971 19940601
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027 ; G01D9/42 ; G03B27/72
Abstract:
An exposure apparatus for exposing a substrate with pulses of light supplied sequentially, is disclosed. The apparatus includes a detector for detecting the light quantity of each pulse, and a controller for controlling the timing of exposure of the substrate with a pulse to be emitted, on the basis of the light quantity provided by at least one pulse preceding the pulse to be emitted.
Public/Granted literature
- US6116005A Method for harvesting corn using variable knife roll speed and gathering belt speed Public/Granted day:2000-09-12
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