发明授权
US5506433A Composite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereon 失效
具有单晶基板和形成在其上的单晶层的复合半导体基板

Composite semiconductor substrate having a single crystal substrate and
a single crystal layer formed thereon
摘要:
A silicon-on-insulator (SOI) structure having a single crystal layer of a group III-V compound semiconductor material contacting a single crystal substrate of sapphire such that a principal surface of the single crystal layer establishes an intimate contact with a corresponding principal surface of the single crystal substrate and the single crystal layer, and the single crystal substrate are bonded with each other while elevating a temperature.
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