发明授权
US5514025A Apparatus and method for chamfering the peripheral edge of a wafer to
specular finish
失效
用于将晶片的周边边缘倒角成倒角的装置和方法
- 专利标题: Apparatus and method for chamfering the peripheral edge of a wafer to specular finish
- 专利标题(中): 用于将晶片的周边边缘倒角成倒角的装置和方法
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申请号: US122941申请日: 1993-09-20
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公开(公告)号: US5514025A公开(公告)日: 1996-05-07
- 发明人: Fumihiko Hasegawa , Masayuki Yamada
- 申请人: Fumihiko Hasegawa , Masayuki Yamada
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co. Ltd.
- 当前专利权人: Shin-Etsu Handotai Co. Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-148231 19910524
- 主分类号: B24B9/00
- IPC分类号: B24B9/00 ; B24B9/06 ; B28D5/00 ; H01L21/304
摘要:
An apparatus for chamfering the peripheral edge of a semiconductor wafer to specular finish, consisting of a turn table with an abrasive table surface, and a wafer holder, which holds the wafer firmly by sucking one face of the wafer, turn the wafer circumferentially, and press the wafer edge against the abrasive table surface in a manner such that the edge of the wafer is brought and kept in contact with the table surface in a way such that the triangle formed by the center of the turn table surface, the center of the wafer and said contact point is normal to the turn table surface and the angle formed between the turn table surface and the wafer is at the beginning substantially close to 0.degree. but said angle is continuously or stepwise increased to a value substantially close to 180.degree., and the wafer holder also moves the wafer in a way such that the contact point is moved on the turn table surface.
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