发明授权
- 专利标题： Shadow mask plate material and shadow mask
- 专利标题（中）： 阴影面具板材料和荫罩
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申请号： US193867申请日： 1994-02-09
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公开(公告)号： US5532088A公开(公告)日： 1996-07-02
- 发明人: Koichi Teshima , Yoshinori Fujimori , Shin-ichi Nakamura , Masayuki Fukuda , Michihiko Inaba , Emiko Higashinakagawa , Yasuhisa Ohtake , Eiichi Akiyoshi
- 申请人： Koichi Teshima , Yoshinori Fujimori , Shin-ichi Nakamura , Masayuki Fukuda , Michihiko Inaba , Emiko Higashinakagawa , Yasuhisa Ohtake , Eiichi Akiyoshi
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX5-079116 19930312
- 主分类号： C22C38/00
- IPC分类号： C22C38/00 ; C22C38/08 ; H01J29/07 ; G03F9/00
摘要：
Disclosed is a shadow mask plate material which consists of an Fe-Ni-based alloy containing iron and nickel as main constituents, has an unrecrystallized texture with a grain size of 10 .mu.m or less, and is excellent in etching characteristics for forming electron beam apertures.
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