发明授权
US5541036A Negative photoresist compositions comprising a photosensitive compound,
an alkoxymethylated melamine and novolak resin
失效
负光致抗蚀剂组合物包含光敏化合物，烷氧基甲基化三聚氰胺和酚醛清漆树脂
- 专利标题： Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin
- 专利标题（中）： 负光致抗蚀剂组合物包含光敏化合物，烷氧基甲基化三聚氰胺和酚醛清漆树脂
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申请号： US46728申请日： 1993-04-16
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公开(公告)号： US5541036A公开(公告)日： 1996-07-30
- 发明人: Akihiko Igawa , Masato Nishikawa , Georg Pawlowski , Ralph Dammel
- 申请人： Akihiko Igawa , Masato Nishikawa , Georg Pawlowski , Ralph Dammel
- 申请人地址： JPX Tokyo
- 专利权人： Hoechst Japan Limited
- 当前专利权人： Hoechst Japan Limited
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-110285 19920428
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/029 ; G03F7/038 ; H01L21/027 ; G03C1/73
摘要：
A negative photoresist composition comprising:(A) a compound represented by the following formula (I): ##STR1## wherein R.sup.1 and R.sup.2 which are different from each other represent a hydrogen atom or a group represented by the following formula (II): ##STR2## (B) an alkoxymethylated melamine, and (C) a novolak resin.The photoresist composition has resolution below submicron, and can form resist patterns with an ideal rectangular profile.
公开/授权文献
- USD378477S Lap tray 公开/授权日：1997-03-18
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