发明授权
- 专利标题: Method of manufacturing optical low-pass filter
- 专利标题(中): 制造光学低通滤波器的方法
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申请号: US248248申请日: 1994-05-24
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公开(公告)号: US5550663A公开(公告)日: 1996-08-27
- 发明人: Osamu Nishizaki , Shigeru Aoyama
- 申请人: Osamu Nishizaki , Shigeru Aoyama
- 申请人地址: JPX Kyoto
- 专利权人: Omron Corporation
- 当前专利权人: Omron Corporation
- 当前专利权人地址: JPX Kyoto
- 主分类号: G02B5/18
- IPC分类号: G02B5/18 ; G02B27/46 ; G02F1/1335 ; G02F1/13 ; H04N9/083
摘要:
A mother layer made of a thermoplastic resin is formed on the substrate. The mother layer is etched to make a grating layer. The etching process is stopped so that an offset layer remains under the grating layer. The grating layer and the offset layer are baked to be molten. The baking process is stopped when a phase grating defined by a surface having a sinusoidal shape is formed.
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