发明授权
- 专利标题: Method for post-cleaning finishing drying
- 专利标题(中): 后清洗整理干燥方法
-
申请号: US235298申请日: 1994-04-29
-
公开(公告)号: US5562945A公开(公告)日: 1996-10-08
- 发明人: Masamichi Hijino , Michio Shirai , Kazuhisa Karaki
- 申请人: Masamichi Hijino , Michio Shirai , Kazuhisa Karaki
- 申请人地址: JPX
- 专利权人: Olympus Optical Co., Ltd.
- 当前专利权人: Olympus Optical Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX5-128536 19930429; JPX6-33022 19940204
- 主分类号: C11D7/28
- IPC分类号: C11D7/28 ; C11D7/50 ; F26B5/00 ; B05D1/18
摘要:
A method for post-cleaning finish drying is provided, by which finish drying of industrial parts can be conducted without leaving residues or corroding the cleaned material. In this method, finish drying can be performed without the use of freon being a cause of destruction of the ozonosphere. Preferably, a cleaned material is dipped (rinsed) in a low molecular weight siloxane having a content of organic compounds, such as dodecamethylpentasiloxane, of less than 0.01% by weight, taken out and dried. Also, preferably, the material rinsed with the low molecular weight siloxane is subjected to a vapor cleaning using a perfluorocarbon compound.
公开/授权文献
- US4888955A Two phase CO.sub.2 storage tank 公开/授权日:1989-12-26