发明授权
US5576441A Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same 失效
感光双(卤代甲基恶二唑)化合物和使用其的感光转印片

Photosensitive bis(halomethyloxadiazole) compound and photosensitive
transfer sheet using the same
摘要:
Photosensitive bis (halomethyloxadiazole) compounds which are capable of producing free radicals upon exposure to light represented by the following general formulae (1) to (4): ##STR1## The symbols in the above formulae are defined in the present specification. The photosensitive bis(halomethyloxadiazole) compound is useful in the fields of recording materials such as photosensitive protecting films, printing plates, photoresists, proofs, etc. Furthermore, a photosensitive transfer sheet using a photosensitive composition containing the photosensitive bis(halomethyloxadiazole) is useful in making a prepress proof for color proofing, a color display, etc.
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