发明授权
- 专利标题: Buffing method
- 专利标题(中): 抛光方法
-
申请号: US517114申请日: 1995-08-21
-
公开(公告)号: US5577949A公开(公告)日: 1996-11-26
- 发明人: Hiroshi Matsumoto
- 申请人: Hiroshi Matsumoto
- 申请人地址: JPX Osaka
- 专利权人: C. Uyemura & Co., Ltd.
- 当前专利权人: C. Uyemura & Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 主分类号: B24B29/00
- IPC分类号: B24B29/00 ; B24B1/00
摘要:
A workpiece is buffed to a scratch-free mirror finish by contacting the workpiece against a buff while rotating the buff at about 100 to 1,000 rpm and feeding a buffing compound to the buff. The buffing compound is a slurry containing 3 to 20 wt % of abrasive grains with a mean grain size of up to 2 .mu.m in an aqueous fatty acid soap solution.
公开/授权文献
信息查询