发明授权
- 专利标题： Waste treatment system in a polishing apparatus
- 专利标题（中）： 抛光装置中的废物处理系统
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申请号： US291530申请日： 1994-08-16
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公开(公告)号： US5584959A公开(公告)日： 1996-12-17
- 发明人: Norio Kimura , Katsuyuki Aoki , Kiyotaka Kawashima , Seiji Ishikawa
- 申请人： Norio Kimura , Katsuyuki Aoki , Kiyotaka Kawashima , Seiji Ishikawa
- 申请人地址： JPX Tokyo
- 专利权人： Ebara Corporation
- 当前专利权人： Ebara Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-223846 19930816; JPX5-225202 19930817
- 主分类号： B01D53/14
- IPC分类号： B01D53/14 ; B01D53/50 ; B01D53/58 ; B24B55/03 ; C02F1/52 ; H01L21/00
摘要：
A waste treatment system in a polishing apparatus treats waste gas and waste liquid discharged from the polishing apparatus. The waste treatment system comprises an exhaust duct provided in a partition wall enclosing the polishing apparatus, a scrubber connected to the exhaust duct through an exhauster for scrubbing waste gas discharged from the polishing apparatus, a waste liquid receiver provided below an abrasive cloth of the polishing apparatus for receiving waste liquid generated by a polishing operation and a waste liquid treatment apparatus connected to the waste liquid receiver for treating the waste liquid discharged from the polishing apparatus.
公开/授权文献
- US6163104A Color cathode-ray tube 公开/授权日：2000-12-19
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