发明授权
- 专利标题： Dual substrate, single-pass printing process and substrates printed thereby
- 专利标题（中）： 双基板，单程印刷工艺和印刷的基板
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申请号： US440430申请日： 1995-05-12
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公开(公告)号： US5597642A公开(公告)日： 1997-01-28
- 发明人: Robert J. Schleinz , Daniel J. Conrad , Joseph S. Kucherovsky
- 申请人： Robert J. Schleinz , Daniel J. Conrad , Joseph S. Kucherovsky
- 申请人地址： WI Neenah
- 专利权人： Kimberly-Clark Corporation
- 当前专利权人： Kimberly-Clark Corporation
- 当前专利权人地址： WI Neenah
- 主分类号： B41M3/06
- IPC分类号： B41M3/06 ; B41F5/18 ; B41F17/00 ; B41F22/00 ; B41M1/00 ; B41M1/26 ; B32B9/00
摘要：
A dual substrate, single-pass printing process prints a high basis weight substrate and a low basis weight substrate. Ink striking through the low basis weight substrate is collected and absorbed by the high basis weight substrate. The printed substrates are then separated and rewound for subsequent transport and handling.
公开/授权文献
- US4491418A Plastics extruder 公开/授权日：1985-01-01
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