发明授权
- 专利标题: Method for improving tenacity and loading of palladium on palladium-doped metal surfaces
- 专利标题(中): 改善钯掺杂金属表面上钯的强度和负载的方法
-
申请号: US400075申请日: 1995-03-07
-
公开(公告)号: US5600692A公开(公告)日: 1997-02-04
- 发明人: Samson Hettiarachchi
- 申请人: Samson Hettiarachchi
- 申请人地址: NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: NY Schenectady
- 主分类号: G21D1/00
- IPC分类号: G21D1/00 ; B01J37/03 ; C23F11/08 ; C23F11/18 ; G01N17/02 ; G21C3/07 ; G21C17/02 ; G21C17/022 ; G21C19/28 ; G21C19/30 ; G21C19/307 ; G21D3/08 ; G21C9/00
摘要:
A method for mitigating crack growth on the surface of stainless steel or other alloy components in a water-cooled nuclear reactor wherein a solution or suspension of a compound containing a noble metal is injected into the coolant water along with a reducing agent. The presence of the reducing agent will assist in better deposition of the noble metal, for example, palladium, on metal surfaces, thereby increasing the noble metal loading and also improving the tenacity with which the noble metal is bound onto the metal. The extent of noble metal doping is important in providing a better (lower) ECP response of the metal in the presence of a stoichiometric ratio of H.sub.2 to O.sub.2, which reduces the hydrogen demand considerably. The more tenacious the noble metal is bound to the metal surface, the longer its expected life will be, particularly under in-reactor Situations where the metal surfaces are subjected to a variety of hydrodynamic conditions.
公开/授权文献
- US4987956A Apparatus for use in drilling a well at an offshore location 公开/授权日:1991-01-29
信息查询