发明授权
- 专利标题： Optical exposure method and device formed by the method
- 专利标题（中）： 通过该方法形成的光学曝光方法和装置
-
申请号： US455154申请日： 1995-05-31
-
公开(公告)号： US5604779A公开(公告)日： 1997-02-18
- 发明人: Mitsuaki Amemiya , Yutaka Watanabe
- 申请人： Mitsuaki Amemiya , Yutaka Watanabe
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-125104 19940607; JPX7-064158 19950323
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; H01L21/30
摘要：
A transfer magnification correcting method suited for use in scanning exposure by use of synchrotron radiation or the like. In proximity exposure according to the scanning exposure method by use of synchrotron radiation, the magnification in the scanning direction is corrected by relatively moving a wafer and a mask simultaneously with the scanning. Also, the overall correction of the magnification is performed by changing a proximity gap or adjusting the temperature of the mask or the wafer. As a result, it is possible to correct the transfer magnification separately in the vertical and horizontal directions.
公开/授权文献
- US4524143A Catalyst for preparation of linear polyethylenepolyamines 公开/授权日：1985-06-18
信息查询
