发明授权
- 专利标题： Process for preparing an X-ray mask structure
- 专利标题（中）： 制备X射线掩模结构的方法
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申请号： US475464申请日： 1995-06-07
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公开(公告)号： US5607733A公开(公告)日： 1997-03-04
- 发明人: Yasuaki Fukuda , Shigeyuki Matsumoto
- 申请人： Yasuaki Fukuda , Shigeyuki Matsumoto
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-186795 19900712; JPX2-199746 19900727
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; C23C8/00
摘要：
A process for preparing an X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.
公开/授权文献
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