发明授权
- 专利标题: Co-deposition of palladium during oxide film growth in high-temperature water to mitigate stress corrosion cracking
- 专利标题(中): 在高温水中氧化膜生长期间钯的共沉积以减轻应力腐蚀开裂
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申请号: US322253申请日: 1994-10-13
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公开(公告)号: US5608766A公开(公告)日: 1997-03-04
- 发明人: Peter L. Andresen , Samson Hettiarachchi , Young J. Kim , Thomas P. Diaz
- 申请人: Peter L. Andresen , Samson Hettiarachchi , Young J. Kim , Thomas P. Diaz
- 申请人地址: NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: NY Schenectady
- 主分类号: G21D1/00
- IPC分类号: G21D1/00 ; B01J37/03 ; C23C8/80 ; C23C12/00 ; C23F11/08 ; C23F11/18 ; G01N17/02 ; G21C17/02 ; G21C17/022 ; G21C19/28 ; G21C19/30 ; G21C19/307 ; G21D3/08 ; G21C9/00
摘要:
A method for improving the performance and longevity of coatings of metal deposited from aqueous solutions of inorganic, organic or oraganometallic metal compounds. The method involves co-deposition of noble metal or corrosion-inhibiting non-noble metal during growth of oxide film on a component made of alloy, e.g., stainless steels and nickel-based alloys. The result is a metal-doped oxide film having a relatively longer life in the reactor operating environment. In particular, incorporation of palladium into the film provides greatly increased catalytic life as compared to palladium coatings which lie on the oxide surface.
公开/授权文献
- USD323705S Kitchen sink or the like 公开/授权日:1992-02-04
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