发明授权
US5608812A Abnormal pattern detecting apparatus, pattern finding apparatus, and linear pattern width calculating apparatus 失效
异常图案检测装置,图案查找装置以及线状图案宽度计算装置

  • 专利标题: Abnormal pattern detecting apparatus, pattern finding apparatus, and linear pattern width calculating apparatus
  • 专利标题(中): 异常图案检测装置,图案查找装置以及线状图案宽度计算装置
  • 申请号: US593692
    申请日: 1996-01-29
  • 公开(公告)号: US5608812A
    公开(公告)日: 1997-03-04
  • 发明人: Kazuo Shimura
  • 申请人: Kazuo Shimura
  • 申请人地址: JPX Kanagawa
  • 专利权人: Fuji Photo Film Co., Ltd.
  • 当前专利权人: Fuji Photo Film Co., Ltd.
  • 当前专利权人地址: JPX Kanagawa
  • 优先权: JPX2-244195 19900914; JPX2-244196 19900914; JPX2-244197 19900914; JPX2-244198 19900914
  • 主分类号: G06T7/00
  • IPC分类号: G06T7/00 G06T7/60 G06K9/00
Abnormal pattern detecting apparatus, pattern finding apparatus, and
linear pattern width calculating apparatus
摘要:
From an image signal made up of a series of image signal components representing a radiation image, an abnormal pattern appearing as an approximately circular pattern in the radiation image is detected. A first finding device finds a prospective abnormal pattern appearing in the radiation image by processing the image signal with a first filter capable of finding an approximately circular pattern. A second finding device finds a linear pattern appearing in the radiation image by processing the image signal with a second filter capable of finding a linear pattern or a linear pattern the width and the length of which are approximately equal to each other. A judgment device selects an enlarged prospective abnormal pattern region in an image area, in which both the prospective abnormal pattern and the linear pattern have been found, the enlarged prospective abnormal pattern region including the prospective abnormal pattern and extending to parts around the prospective abnormal pattern. The area and the maximum width of the linear pattern falling within the enlarged prospective abnormal pattern region are then calculated. From the area and the maximum width of the linear pattern, a judgment is made as to whether the prospective abnormal pattern is or is not a true abnormal pattern.
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