发明授权
- 专利标题： Process for purification of hydrogen peroxide
- 专利标题（中）： 纯化过氧化氢的方法
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申请号： US408123申请日： 1995-03-21
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公开(公告)号： US5614165A公开(公告)日： 1997-03-25
- 发明人: Yasuo Sugihara , Kazushige Tanaka , Hisashi Sakaitani
- 申请人： Yasuo Sugihara , Kazushige Tanaka , Hisashi Sakaitani
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Gas Chemical Co., Inc.
- 当前专利权人： Mitsubishi Gas Chemical Co., Inc.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-127310 19930528
- 主分类号： B01J45/00
- IPC分类号： B01J45/00 ; C01B15/013 ; C01B15/01
摘要：
A process for purification of hydrogen peroxide is provided which comprises contacting an aqueous hydrogen peroxide solution with a chelate resin. According to the process, it is possible to remove impurities in the aqueous hydrogen peroxide solution in high efficiency, and particularly, it is possible to remove iron, aluminum, etc., which are difficult to remove singly by ion exchange resins, up to extremely low concentrations. Highly pure hydrogen peroxide solutions obtained by this invention can suitably used for washing of silicon wafers.
公开/授权文献
- US4402517A Well packer valve arrangement 公开/授权日：1983-09-06
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