Invention Grant
- Patent Title: Pattern learning method
- Patent Title (中): 模式学习方法
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Application No.: US339883Application Date: 1994-11-14
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Publication No.: US5617483APublication Date: 1997-04-01
- Inventor: Akira Osawa
- Applicant: Akira Osawa
- Applicant Address: JPX Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: JPX Kanagawa
- Priority: JPX4-018864 19920204; JPX4-347237 19921225
- Main IPC: G06F15/18
- IPC: G06F15/18 ; G06K9/64 ; G06K9/66 ; G06N3/00 ; G06N99/00 ; G06T7/00 ; G06K9/62
Abstract:
In a pattern learning method, each of pieces of information representing a plurality of different fundamental patterns is presented to a large number of cells of a neural network, and the cells are thereby caused to learn a large number of feature patterns. The method comprises the steps of causing a cell, which best matches with a fundamental pattern having been presented to the neural network, to learn the fundamental pattern. For neighboring cells that fall within a neighboring region having a predetermined range and neighboring with the cell, which best matches with the fundamental pattern having been presented to the neural network, spatial interpolating operations are carried out from the fundamental pattern, which has been presented to the neural network, and a fundamental pattern, which is other than the fundamental pattern having been presented to the neural network and which has been learned by a cell that is among the large number of the cells of the neural network and that is other than the cell best matching with the fundamental pattern having been presented to the neural network. The neighboring cells are caused to learn the results of the spatial interpolating operations.
Public/Granted literature
- US5111214A Linear array antenna with E-plane backlobe suppressor Public/Granted day:1992-05-05
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